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1

Dependence of polymer main-chain structure on roughness formation of ArF photoresists in the plasma etching processes

Uesugi, Takuji, Okada, Takeru, Wada, Akira, Kato, Keisuke, Yasuda, Atsushi, Maeda, Shinichi, Samukawa, Seiji

Journal:

Journal of Physics D Applied Physics

Year:

2012

Language:

english

File:

PDF, 839 KB

english, 2012

2

On-wafer monitoring of plasma-induced electrical current in silicon dioxide to predict plasma radiation damage

Okigawa, Mitsuru, Ishikawa, Yasushi, Samukawa, Seiji

Journal:

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures

Year:

2005

Language:

english

File:

PDF, 944 KB

english, 2005

3

Atomic layer germanium etching for 3D Fin-FET using chlorine neutral beam

Ohori, Daisuke, Fujii, Takuya, Noda, Shuichi, Mizubayashi, Wataru, Endo, Kazuhiko, Lee, En-Tzu, Li, Yiming, Lee, Yao-Jen, Ozaki, Takuya, Samukawa, Seiji

Journal:

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Year:

2019

Language:

english

File:

PDF, 1.12 MB

english, 2019

4

Decisive factors affecting plasma resistance and roughness formation in ArF photoresist

Jinnai, Butsurin, Uesugi, Takuji, Koyama, Koji, Kato, Keisuke, Yasuda, Atsushi, Maeda, Shinichi, Momose, Hikaru, Samukawa, Seiji

Journal:

Journal of Physics D Applied Physics

Year:

2010

Language:

english

File:

PDF, 621 KB

english, 2010

5

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Advanced Etch Technology for Nanopatterning IV - Low-temperature and damage-free transition metal and magnetic material etching using a new metallic complex reaction

Lin, Qinghuang, Engelmann, Sebastian U., Zhang, Ying, Nozawa, Toshihisa, Miyama, Ryo, Kubota, Shinji, Moyama, Kazuki, Kubota, Tomihiro, Samukawa, Seiji

Year:

2015

Language:

english

File:

PDF, 492 KB

english, 2015

6

The effects of polymer side-chain structure on roughness formation of ArF photoresist in plasma etching processes

Uesugi, Takuji, Okada, Takeru, Wada, Akira, Kato, Keisuke, Yasuda, Atsushi, Maeda, Shinichi, Samukawa, Seiji

Journal:

Journal of Physics D Applied Physics

Year:

2012

Language:

english

File:

PDF, 661 KB

english, 2012

7

[IEEE 2016 IEEE Silicon Nanoelectronics Workshop (SNW) - Honolulu, HI, USA (2016.6.12-2016.6.13)] 2016 IEEE Silicon Nanoelectronics Workshop (SNW) - Neutral beam technology -defect-free nanofabrication for novel nano-materials and nano-devices

Samukawa, Seiji

Year:

2016

Language:

english

File:

PDF, 205 KB

english, 2016

8

Effect of neutral beam etching on mechanical property of microcantilevers

Nishimori, Yuki, Ueki, Shinji, Miwa, Kazuhiro, Kubota, Tomohiro, Sugiyama, Masakazu, Samukawa, Seiji, Hashiguchi, Gen

Journal:

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures

Year:

2013

Language:

english

File:

PDF, 1.52 MB

english, 2013

9

Hard-Mask-Through UV-Light-Induced Damage to Low- k Film during Plasma Process for Dual Damascene

Matsunaga, Noriaki, Okumura, Hirokatsu, Jinnai, Butsurin, Samukawa, Seiji

Journal:

Japanese Journal of Applied Physics

Year:

2010

Language:

english

File:

PDF, 881 KB

english, 2010

10

Coherent and incoherent impacts of nanopillars on the thermal conductivity in silicon nanomembranes

Huang, Xin, Ohori, Daisuke, Yanagisawa, Ryoto, Anufriev, Roman, Samukawa, Seiji, Nomura, Masahiro

Journal:

ACS Applied Materials & Interfaces

Year:

2020

File:

PDF, 23.05 MB

2020

11

[IEEE 2020 IEEE 20th International Conference on Nanotechnology (IEEE-NANO) - Montreal, QC, Canada (2020.7.29-2020.7.31)] 2020 IEEE 20th International Conference on Nanotechnology (IEEE-NANO) - New Proficient Ferroelectric Nanosheet Line Tunneling FETs with Strained SiGe through Scaled n-epitaxial Layer

Thoti, Narasimhulu, Li, Yiming, Kola, Sekhar Reddy, Samukawa, Seiji

Year:

2020

File:

PDF, 1.11 MB

2020

12

Effects of formation of mini-bands in two-dimensional array of silicon nanodisks with SiC interlayer for quantum dot solar cells

Igarashi, Makoto, Budiman, Mohd Fairuz, Pan, Wugen, Hu, Weiguo, Tamura, Yosuke, Syazwan, Mohd Erman, Usami, Noritaka, Samukawa, Seiji

Journal:

Year:

2013

Language:

english

File:

PDF, 1.03 MB

english, 2013

13

Ultra-low-damage radical treatment for the highly controllable oxidation of large-scale graphene sheets

Huang, Chi-Hsien, Su, Ching-Yuan, Lai, Chao-Sung, Li, Yen-Cheng, Samukawa, Seiji

Journal:

Year:

2014

Language:

english

File:

PDF, 1.42 MB

english, 2014

14

High-Efficiency Neutral-Beam Generation by Combination of Inductively Coupled Plasma and Parallel Plate DC Bias

Samukawa, Seiji, Sakamoto, Keisuke, Ichiki, Katsunori

Journal:

Japanese Journal of Applied Physics

Year:

2001

Language:

english

File:

PDF, 60 KB

english, 2001

15

[IEEE 2007 IEEE International Conference on Integrated Circuit Design and Technology - Austin, TX, USA (2007.05.30-2007.06.1)] 2007 IEEE International Conference on Integrated Circuit Design and Technology - Plasma-Induced Damage and Its Control in Plasma Etching Processes

Samukawa, Seiji

Year:

2007

Language:

english

File:

PDF, 809 KB

english, 2007

16

[IEEE 2014 9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems (NEMS) - Waikiki Beach, HI, USA (2014.4.13-2014.4.16)] The 9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems (NEMS) - Fabrication and evaluation of silicon micromechanical resonator using neutral beam etching technology

Van Toan, Nguyen, Kubota, Tomohiro, Seknar, Halubai, Samukawa, Seiji, Ono, Takahito

Year:

2014

Language:

english

File:

PDF, 3.32 MB

english, 2014

17

200-mm-diameter neutral beam source based on inductively coupled plasma etcher and silicon etching

Kubota, Tomohiro, Nukaga, Osamu, Ueki, Shinji, Sugiyama, Masakazu, Inamoto, Yoshimasa, Ohtake, Hiroto, Samukawa, Seiji

Journal:

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Year:

2010

Language:

english

File:

PDF, 466 KB

english, 2010

18

Effect of supplied substrate bias frequency in ultrahigh-frequency plasma discharge for precise etching processes

Samukawa, Seiji

Journal:

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Year:

1996

Language:

english

File:

PDF, 535 KB

english, 1996

19

[IEEE 2010 IEEE International Symposium on Circuits and Systems - ISCAS 2010 - Paris, France (2010.05.30-2010.06.2)] Proceedings of 2010 IEEE International Symposium on Circuits and Systems - A 2-dimensional Si nanodisk array structure for spiking neuron models

Morie, Takashi, Sun, Yilai, Liang, Haichao, Igarashi, Makoto, Huang, Chi-Hsien, Samukawa, Seiji

Year:

2010

Language:

english

File:

PDF, 453 KB

english, 2010

20

Highly selective silicon nitride etching to Si and SiO 2 for a gate sidewall spacer using a CF 3 I/O 2 /H 2 neutral beam

Nakayama, Daiki, Wada, Akira, Kubota, Tomohiro, Bruce, Robert, Martin, Ryan M, Haass, Moritz, Fuller, Nicholas, Samukawa, Seiji

Journal:

Journal of Physics D Applied Physics

Year:

2013

Language:

english

File:

PDF, 1.30 MB

english, 2013

21

Chemical Reaction Dynamics of SiO 2 Etching by CF 2 Radicals: Tight-Binding Quantum Chemical Molecular Dynamics Simulations

Ito, Hiroshi, Kuwahara, Takuya, Higuchi, Yuji, Ozawa, Nobuki, Samukawa, Seiji, Kubo, Momoji

Journal:

Japanese Journal of Applied Physics

Year:

2013

Language:

english

File:

PDF, 1.61 MB

english, 2013

22

Irradiation-Damages in Atmospheric Plasma Used in a Resist Ashing Process for Thin Film Transistors

Sato, Taiki, Ueno, Akira, Yara, Takuya, Miyamoto, Eiji, Uraoka, Yukiharu, Kubota, Tomohiro, Samukawa, Seiji

Journal:

Japanese Journal of Applied Physics

Year:

2009

Language:

english

File:

PDF, 234 KB

english, 2009

23

[IEEE 2016 IEEE 16th International Conference on Nanotechnology (IEEE-NANO) - Sendai, Japan (2016.8.22-2016.8.25)] 2016 IEEE 16th International Conference on Nanotechnology (IEEE-NANO) - Transient photoluminescence in InGaN nano-disks fabricated by nano-scale neutral-beam etching utilizing bio-nano templates

Chen, Yafeng, Chen, Shula, Kiba, Takayuki, Lee, Chang Yong, Thomas, Cedric, Lai, Yi-Chun, Higo, Akio, Samukawa, Seiji, Murayama, Akihiro

Year:

2016

Language:

english

File:

PDF, 246 KB

english, 2016

24

Pulse-Time-Modulated Plasma and its Applications for Plasma Etching

Samukawa, Seiji, Mieno, Tetsu

Journal:

IEEJ Transactions on Fundamentals and Materials

Year:

1998

File:

PDF, 1.91 MB

1998

25

Film-nanostructure-controlled inerasable-to-erasable switching transition in ZnO-based transparent memristor devices: sputtering pressure dependency

Simanjuntak, Firman Mangasa, Ohno, Takeo, Samukawa, Seiji

Journal:

ACS Applied Electronic Materials

Year:

2019

Language:

english

File:

PDF, 13.92 MB

english, 2019

26

[IEEE 2019 Compound Semiconductor Week (CSW) - Nara, Japan (2019.5.19-2019.5.23)] 2019 Compound Semiconductor Week (CSW) - High efficiency 100-nm-sized InGaN/GaN active region fabricated by neutral-beam-etching and GaN regrowth for directional micro-LED

Zhang, Kexiong, Takahashi, Tokio, Ohori, Daisuke, Cong, Guangwei, Endo, Kazuhiko, Kumagai, Naoto, Samukawa, Seiji, Shimizu, Mitsuaki, Wang, Xuelun

Year:

2019

Language:

english

File:

PDF, 605 KB

english, 2019

27

High-quality nanodisk of InGaN/GaN MQWs fabricated by neutral-beam-etching and GaN regrowth: Towards directional micro-LED in top-down structure

Zhang, Kexiong, Takahashi, Tokio, Ohori, Daisuke, Cong, Guangwei, Endo, Kazuhiko, Kumagai, Naoto, Samukawa, Seiji, Shimizu, Mitsuaki, Wang, Xuelun

Journal:

Semiconductor Science and Technology

Year:

2020

Language:

english

File:

PDF, 1.23 MB

english, 2020

28

Decreasing of the thermal conductivity of Si nanopillar/SiGe composite films investigated by using a piezoelectric photothermal spectroscopy

Harada, Tomoki, Aki, Tsubasa, Ohori, Daisuke, Samukawa, Seiji, Ikari, Tetsuo, Fukuyama, Atsuhiko

Journal:

Japanese Journal of Applied Physics

Year:

2020

File:

PDF, 678 KB

2020

29

Fabrication and simulation of neutral-beam-etched silicon nanopillars

Chuang, Min-Hui, Ohori, Daisuke, Li, Yiming, Chou, Kuan-Ru, Samukawa, Seiji

Journal:

Year:

2020

File:

PDF, 3.29 MB

2020

30

High-performance and damage-free neutral-beam etching processes using negative ions in pulse-time-modulated plasma

Journal:

Applied Surface Science

Year:

2007

Language:

english

File:

PDF, 1.38 MB

english, 2007

31

Preface

Toshiaki Makabe, Seiji Samukawa

Journal:

Applied Surface Science

Year:

2007

Language:

english

File:

PDF, 63 KB

english, 2007

32

Effects of low-molecular-weight radicals for reduction of microloading in high-aspect contact-hole etching

Seiji Samukawa, Tomonori Mukai

Journal:

Thin Solid Films

Year:

2000

Language:

english

File:

PDF, 1.10 MB

english, 2000

33

High-performance and damage-free plasma etching processes for future ULSI patterning

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 628 KB

english, 2000

34

Development of high-density plasma reactor for high-performance processing and future prospects

Journal:

Applied Surface Science

Year:

2002

Language:

english

File:

PDF, 936 KB

english, 2002

35

New gas chemistries for high-performance and chargeless dielectric etching

Seiji Samukawa, Tomonori Mukai, Ko Noguchi

Journal:

Materials Science in Semiconductor Processing

Year:

1999

Language:

english

File:

PDF, 207 KB

english, 1999

36

Plasma-Radiation-Induced Interface States in Metal-Nitride-Oxide-Silicon Structure of Charge-Coupled Device Image Sensor and Their Reduction Using Pulse-Time-Modulated Plasma

Okigawa, Mitsuru, Ishikawa, Yasushi, Samukawa, Seiji

Journal:

Japanese Journal of Applied Physics

Year:

2003

Language:

english

File:

PDF, 302 KB

english, 2003

37

Super-low-k SiOCH film (k = 1.9) with extremely high water resistance and thermal stability formed by neutral-beam-enhanced CVD

Yasuhara, Shigeo, Sasaki, Toru, Shimayama, Tsutomu, Tajima, Kunitoshi, Yano, Hisashi, Kadomura, Shingo, Yoshimaru, Masaki, Matsunaga, Noriaki, Samukawa, Seiji

Journal:

Journal of Physics D Applied Physics

Year:

2010

Language:

english

File:

PDF, 1.26 MB

english, 2010

38

The 2012 Plasma Roadmap

Samukawa, Seiji, Hori, Masaru, Rauf, Shahid, Tachibana, Kunihide, Bruggeman, Peter, Kroesen, Gerrit, Whitehead, J Christopher, Murphy, Anthony B, Gutsol, Alexander F, Starikovskaia, Svetlana, Kortshag

Journal:

Journal of Physics D Applied Physics

Year:

2012

Language:

english

File:

PDF, 2.49 MB

english, 2012

39

Method to Evaluate the Influence of Etching Damage on Microcantilever Surface on Its Mechanical Properties

Ueki, Shinji, Nishimori, Yuki, Imamoto, Hiroshi, Kubota, Tomohiro, Sugiyama, Masakazu, Kawakatsu, Hideki, Samukawa, Seiji, Hashiguchi, Gen

Journal:

Japanese Journal of Applied Physics

Year:

2011

Language:

english

File:

PDF, 308 KB

english, 2011

40

Theory of instabilities in crossed-field discharges at low pressures

Abolmasov, Sergey N., Samukawa, Seiji, Bizyukov, Alexander A.

Journal:

Physics of Plasmas

Year:

2007

Language:

english

File:

PDF, 679 KB

english, 2007

41

Modeling miniband for realistic silicon nanocrystal array

Hu, Weiguo, Budiman, Mohd Fairuz, Igarashi, Makoto, Lee, Ming-Yi, Li, Yiming, Samukawa, Seiji

Journal:

Mathematical and Computer Modelling

Year:

2013

Language:

english

File:

PDF, 474 KB

english, 2013

42

[IEEE 2010 Ninth IEEE Sensors Conference (SENSORS 2010) - Kona, HI (2010.11.1-2010.11.4)] 2010 IEEE Sensors - Mechanism of mechanical deterioration in silicon microcantilever induced by plasma process

Tomura, Maju, Chi-Hsein Huang,, Samukawa, Seiji, Yoshida, Yusuke, Ono, Takahito, Yamasaki, Satoshi

Year:

2010

Language:

english

File:

PDF, 718 KB

english, 2010

43

Picosecond carrier dynamics induced by coupling of wavefunctions in a Si-nanodisk array fabricated by neutral beam etching using bio-nano-templates

Takayuki Kiba, Yoshiya Mizushima, Makoto Igarashi, Seiji Samukawa, Akihiro Murayama

Journal:

Nanoscale Research Letters

Year:

2012

Language:

english

File:

PDF, 322 KB

english, 2012

44

Plasmonic enhancements of photoluminescence in hybrid Si nanostructures with Au fabricated by fully top-down lithography

Koudo Nakaji, Hao Li, Takayuki Kiba, Makoto Igarashi, Seiji Samukawa, Akihiro Murayama

Journal:

Nanoscale Research Letters

Year:

2012

Language:

english

File:

PDF, 365 KB

english, 2012

45

Control of optical bandgap energy and optical absorption coefficient by geometric parameters in sub-10 nm silicon-nanodisc array structure

Budiman, Mohd Fairuz, Hu, Weiguo, Igarashi, Makoto, Tsukamoto, Rikako, Isoda, Taiga, Itoh, Kohei M, Yamashita, Ichiro, Murayama, Akihiro, Okada, Yoshitaka, Samukawa, Seiji

Journal:

Year:

2012

Language:

english

File:

PDF, 966 KB

english, 2012

46

Photoluminescence from GaAs nanodisks fabricated by using combination of neutral beam etching and atomic hydrogen-assisted molecular beam epitaxy regrowth

Kaizu, Toshiyuki, Tamura, Yosuke, Igarashi, Makoto, Hu, Weiguo, Tsukamoto, Rikako, Yamashita, Ichiro, Samukawa, Seiji, Okada, Yoshitaka

Journal:

Applied Physics Letters

Year:

2012

Language:

english

File:

PDF, 1.17 MB

english, 2012

47

Novel Si Nanodisk Fabricated by Biotemplate and Defect-Free Neutral Beam Etching for Solar Cell Application

Huang, Chi-Hsien, Igarashi, Makoto, Horita, Susumu, Takeguchi, Masaki, Uraoka, Yukiharu, Fuyuki, Takashi, Yamashita, Ichiro, Samukawa, Seiji

Journal:

Japanese Journal of Applied Physics

Year:

2010

Language:

english

File:

PDF, 324 KB

english, 2010

48

Optical absorption characteristic of highly ordered and dense two-dimensional array of silicon nanodiscs

Huang, Chi-Hsien, Wang, Xuan-Yu, Igarashi, Makoto, Murayama, Akihiro, Okada, Yoshitaka, Yamashita, Ichiro, Samukawa, Seiji

Journal:

Year:

2011

Language:

english

File:

PDF, 1.35 MB

english, 2011

49

Direct Fabrication of Uniform and High Density Sub-10-nm Etching Mask Using Ferritin Molecules on Si and GaAs Surface for Actual Quantum-Dot Superlattice

Igarashi, Makoto, Tsukamoto, Rikako, Huang, Chi-Hsien, Yamashita, Ichiro, Samukawa, Seiji

Journal:

Applied Physics Express

Year:

2011

Language:

english

File:

PDF, 1.11 MB

english, 2011

50

[IEEE 2011 37th IEEE Photovoltaic Specialists Conference (PVSC) - Seattle, WA, USA (2011.06.19-2011.06.24)] 2011 37th IEEE Photovoltaic Specialists Conference - Optical absorption, photo-luminescence and miniband formation of a highly ordered and dense 2-dimensional array of Si nanodisks for quantum dot solar cells

Igarashi, Makoto, Huang, Chi-Hsien, Wang, Xuan-Yu, Budiman, Mohd Fairuz, Tamura, Yosuke, Kiba, Takayuki, Murayama, Akihiro, Kaizu, Toshiyuki, Okada, Yoshitaka, Samukawa, Seiji

Year:

2011

Language:

english

File:

PDF, 1.41 MB

english, 2011